| 摘要 |
PROBLEM TO BE SOLVED: To enable development with an aq. alkali soln. and to ensure heat and solvent resistances by incorporating epoxy resin, a photo-cationic polymn. initiator, a phenothiazine compd. and a diluent. SOLUTION: This resist resin compsn. contains epoxy resin and/or carboxyl group-contg. epoxy resin, a photo-cationic polymn. initiator, a phenothiazine compd. and a diluent as an optional component preferably by 20-99.7wt.%, especially 30-95wt.%, 0.3-15wt.%, especially 1-16wt.%, 0.01-5wt.%, especially 0.05-3wt.% and 0-70wt.%, especially 10-60wt.%, respectively. It is applied on a laminated plate with an adhesive in 20-60μm thickness and is dried at 60-130 deg.C for about 5-60min to form a resist layer. |
