| 摘要 |
PROBLEM TO BE SOLVED: To substantially shorten an exposure time in the case of many repeated exposure with the same pattern in one exposure block. SOLUTION: When each block of a substrate 3 is scanning-exposed with a mask 1 pattern by scanning-moving the mask and the substrate relatively in synchronization with exposure light 6, in the case when there is an area where the same pattern image B should be formed repeatedly and continuously in one exposure block, the movement of the mask is stopped when the pattern portion B of the mask pattern corresponding to the pattern image reaches the exposure position (y2), and the movement of the substrate is continued (y4 to y5), and exposures are performed every time each pattern image portion B in the area where the above pattern image should be formed repeatedly reaches the exposure position. At this time, as the pattern portion corresponding to the pattern image formed repeatedly and continuously on one exposure block, a mask having only one pattern portion B of the repetition unit can be used. |
