发明名称 Lead frame for semiconductor device and process for producing the same
摘要 The present invention relates to a lead frame for the formation of a frame structure of an integrated circuit, more particularly, to a lead frame, having a structure possessing excellent bondability, solder wettability, and Ag paste adhesion. A lead frame for a semiconductor device comprises a lead frame material; a Pd plating or a Pd alloy plating, provided on the lead frame material; and a layer as an uppermost layer formed of a Pd oxide and gold or silver. A process for producing a lead frame for a semiconductor device comprises the steps of: plating a lead frame material with Pd or a Pd alloy; flasing the surface of the Pd or Pd alloy plating with gold (Au); and heat-treating the plated lead frame material in the air to provide a thin Pd oxide layer in only a Pd portion on the surface of a diffusion layer formed of Pd and Au.
申请公布号 US5801436(A) 申请公布日期 1998.09.01
申请号 US19970967056 申请日期 1997.11.10
申请人 SERIZAWA, SEIICHI 发明人 SERIZAWA, SEIICHI
分类号 H01L23/50;H01L23/495;(IPC1-7):H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/50
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