Light exposure and illuminating apparatus

摘要

A light exposure illuminating apparatus is provided which, employing harmonics of a continuously outputted laser beam, is small-sized, inexpensive and free from speckles and which achieves a high light source utilization efficiency. Specifically, a harmonics generating 1 generates fourth harmonics which are reflected and swept via a scanning lens 2 by a polygonal mirror 3. A cylindrical reflecting mirror radiates the fourth harmonics reflected by the polygonal mirror 3 on an arcuate aperture formed in a light exposure mask by a sweeping movement. The light of fourth harmonics transmitted through the arcuate aperture reaches a reticle 7 set on a semiconductor pattern. The illuminating light passed through the reticle 7 is projected on a wafer 9 via a concave mirror 5 and a convex mirror 76. The area of light exposure may be increased since the reticle 7 and the wafer 9 are moved in synchronism with the scanning of the scanning optical system.