| 摘要 |
A device including a sputtering cathode 2 and masks for masking or covering portions of a surface of a substrates 27, having a center mask guide element 56 on which a center mask 26, which covers the substrate 27, is disposed and works together with an outer mask 4 in such a way that only the uncovered part of the substrate 27 is coated during the coating process. The inner and/or the outer masks 4, 26 can be adjusted independently of each other along a longitudinal center axis 58 of the device.
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