发明名称 Structure and fabrication of semiconductor device having merged resistive/capacitive plate and/or surface layer that provides ESD protection
摘要 A compact RC semiconductor structure suitable for integrated RC and RCD networks contains a semiconductor body (10), an overlying dielectric layer (14), and a resistive plate (16A) situated over the dielectric layer. The resistive plate constitutes both a resistor and at least part of the upper plate of a capacitor whose lower plate (12) is formed with part of the semiconductor body below the dielectric layer. A capacitive structure which provides high ESD protection is formed with a semiconductor body (10) that contains a heavily doped surface layer (12) whose sheet resistance is no more than 5 ohms/square. The surface layer constitutes the lower plate for a capacitor whose upper plate is formed with a conductive plate (16A) situated on a dielectric layer (14) overlying the semiconductor body.
申请公布号 US5801065(A) 申请公布日期 1998.09.01
申请号 US19960609414 申请日期 1996.03.01
申请人 UNIVERSAL SEMICONDUCTOR, INC. 发明人 RIZVI, WAJID H.;DENDULURI, MURALI K.;ANZELC, GREG;FONG, HENRY P. Y.;SHINKRE, RAHUL B.;HO, DANIEL Q.
分类号 H01L21/02;H01L27/06;(IPC1-7):H01L21/70 主分类号 H01L21/02
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