A resist composition comprising (A) a high-molecular compound having at least one functional group which is decomposed by an acid to impart alkali solubility and containing no aromatic rings, (B) a compound which generates an acid upon irradiation with an actinic radiation, and (C) an amine having a molecular weight of 100 to 240 and a boiling point at 760 mmHg of 200 to 350 DEG C.
