发明名称 REDUCED SOLVENT ANTISTATIC HARD COAT
摘要 <p>A cured antistatic coating comprising a fluorinated ionic salt of general formula (1), wherein M<+> represents a cation, Q represents a carbon atom, a nitrogen atom, or an oxygen atom, each X independently represents a divalent linking group, Rf represents a fluorinated group; and R' represents a monovalent organic group. When Q is carbon c is 3 and m is 1, 2, or 3; when Q is nitrogen c is 2 and m is 1 or 2, and when Q is oxygen, c is 1 and m is 1. In another embodiment, the above fluorinated ionic salt may be incorporated into an antistatic coating obtained from ingredients comprising a radiation-curable material; a nonionic perfluoro surfactant; and a radiation-curable silicone-containing compound.</p>
申请公布号 EP0813740(B1) 申请公布日期 1998.08.26
申请号 EP19960903464 申请日期 1996.01.11
申请人 IMATION CORP (A DELAWARE CORPORATION) 发明人 HA, CHAU, T.;INVIE, JUDITH, M.;LAMANNA, WILLIAM, M.
分类号 G11B7/253;G11B7/254;(IPC1-7):G11B27/24;B32B27/08 主分类号 G11B7/253
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