发明名称 |
Method of cleaning semiconductor wafers after lapping |
摘要 |
<p>There is disclosed a method of cleaning a semiconductor wafer after lapping in the manufacture thereof comprising the steps of slicing a monocrystalline ingot into a semiconductor wafer, and chamfering, lapping, acid-etching, and then mirror-polishing the thus-obtained semiconductor wafer. The semiconductor wafer is cleaned in a strong-alkaline aqueous solution at a point of time after the lapping and before the acid-etching, such that the surface of the semiconductor wafer is dissolved in an amount in the range of 4 - 8 mu m. The cleaning method prevents generation of a protrusion on the outer circumferential end portion of the wafer in the subsequent acid-etching step.</p> |
申请公布号 |
EP0860864(A2) |
申请公布日期 |
1998.08.26 |
申请号 |
EP19980300986 |
申请日期 |
1998.02.11 |
申请人 |
SHIN-ETSU HANDOTAI COMPANY LIMITED |
发明人 |
MIYAZAKI, SEIICHI;OKADA, SUMIYOSHI |
分类号 |
B08B3/08;B05D5/00;B24B55/06;B81C1/00;C23F1/40;C23G1/14;H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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