| 摘要 |
A work processing apparatus and a work measuring method are provided in which a work (200) can be processed or planarized without decreasing a processing rate and/or an operating rate of the apparatus. The apparatus can be reduced in size, and measure the state of planarization of the work (200) at a high degree of accuracy. The apparatus includes a rotatable surface plate (1), and a carrier (6) for swinging or oscillating a work (200) in a radial direction of the surface plate (1) while pressing the work (200) against the surface plate (1). The surface plate (1) is divided into an inner surface plate member (11), an intermediate surface plate member (12) and an outer surface plate member (13) which are all disposed in a concentric relation and rotatable independently of each other. The intermediate surface plate member (12) is disposed between the inner and outer surface plate members (11). <IMAGE> |
