发明名称 Illumination optical apparatus and projection exposure apparatus using it
摘要 The illumination optical apparatus of this invention is so arranged that light from a discharge lamp is collected by a rotationally symmetric collector mirror, the thus collected light is collimated into nearly parallel light by a collimator optical system, an optical integrator splits the parallel light into a plurality of light beams to form a plurality of secondary light sources, and thereafter the light from the secondary light sources is projected through a condenser optical system. A secondary light source distribution shaping portion is provided for shaping a light intensity distribution of the plural secondary light sources into a predetermined light intensity distribution, the two electrodes of the anode and cathode in the same discharge lamp are located in a predetermined relation, and an entrance surface of the optical integrator is located at a predetermined position with respect to a position where an image of a reflecting surface of the rotationally symmetric collector mirror is formed by the same collimator optical system.
申请公布号 US5798823(A) 申请公布日期 1998.08.25
申请号 US19950559398 申请日期 1995.11.15
申请人 NIKON CORPORATION 发明人 KUDO, YUJI
分类号 G02B27/09;G03F7/20;H01L21/027;(IPC1-7):G03B27/42;G03B27/54 主分类号 G02B27/09
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