发明名称 SUBSTRATE HOLDER
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate holder which can hold by vacuum-sucking a glass substrate, etc., mounted on an aligner used in a photolithography process, in manufacturing a liquid crystal display device, etc., by reducing the rising amount of the glass substrate. SOLUTION: A substrate holder 1 is provided with a plurality of vacuum grooves 3 on a substrate-placing surface, on which a glass substrate 2 is placed and the grooves 3 are formed, such that the adjacent grooves which are arranged at longer intervals are formed lower in height than the adjacent grooves which are arranged at shorter intervals. In addition, the opening 5 sidewalls of the grooves adjacent to an opening 5, which is formed for vertically moving a reference plate 4 for alignment, are made lower in height than the opposite walls of the grooves.</p>
申请公布号 JPH10229116(A) 申请公布日期 1998.08.25
申请号 JP19970047103 申请日期 1997.02.14
申请人 NIKON CORP 发明人 SHIMIZU KENJI
分类号 G02F1/13;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 G02F1/13
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