发明名称 POSITIVE PHOTORESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a compsn. which is enough suitable for light in a specified wavelength region and has high sensitivity for light and excellent storage stability by selecting a protective group (acid decomposable group) for an alkali- soluble group which is decomposed by the effect of an acid. SOLUTION: This compsn. contains a resin having an ester group expressed by a formula in the molecule and a compd. which produces an acid by irradiation of active rays or radiation. In the formula, R1 is a hydrogen atom, alkyl group or cycloalkyl group, R2 and R3 may be same or different and are hydrogen atoms, alkyl groups, cycloalkyl groups or -A-R4 , and R2 and R3 may be bonded to form a ring. R4 is a hydrogen atom, alkyl group or cycloalkyl group, and R4 and R2 or R4 and R3 may be bonded to form a ring. A is an oxygen atom or sulfur atom. Thereby, the obtd. compsn. is enough suitable for light in 170 to 220nm wavelength region and has high sensitivity for light and excellent storage stability.
申请公布号 JPH10228111(A) 申请公布日期 1998.08.25
申请号 JP19970032431 申请日期 1997.02.17
申请人 FUJI PHOTO FILM CO LTD 发明人 SATO KENICHIRO
分类号 G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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