发明名称 TABLE DEVICE AND PLASMA PROCESSOR USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide a table device and plasma processor using the same capable of controlling temperature excellently without destructing a processed body even under low pressure. SOLUTION: A table device 17 for temperature-controlling a processed body to be processed inside a chamber 11 is to be equipped with a table main body 19 wherein the shape of a mounting surface 20 is formed in a recessed and curved shape, a temperature control means 21 provided inside the table main body 19 for controlling the temperature of the mounting surface 20, as well as a clamping means 26 provided on the mounting surface 20 side of the table main body 19 tightly pressing the processed body 18 against the mounting surface 20.</p>
申请公布号 JPH10223736(A) 申请公布日期 1998.08.21
申请号 JP19970025202 申请日期 1997.02.07
申请人 TOSHIBA CORP 发明人 YAMAZAKI OSAMU;SAITO SHUICHI
分类号 H01L21/302;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/302
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