| 摘要 |
PROBLEM TO BE SOLVED: To measure the beam current of an ion beam by a beam-current meter at the same position as on a substrate, without obstructing ion implanting to the substrate. SOLUTION: This apparatus comprises a vacuum vessel 20, a parallel hexahedral rotary holder 22 housing this vessel, platens 22 disposed at mutually opposite side faces 22a, 22b of the holder 22 for holding a substrate 8, beam-current meters 26 disposed on the remaining two opposite side faces 22c, 22d for measuring the beam currents of an ion beam 6 from an ion source 4, and holder rotation mechanism disposed below the holder 22 for rotating the holder 22, stepwise by 90 deg. with the center at a center shaft 23 parallel to the side face of the holder. The ion source 4 is mounted on one side face of the vessel 20 for irradiating an ion beam in a fixed direction on the substrate 8 held with the platens 24 on the holder 22.
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