PHOTOSENSITIVE COMPOSITION FOR COLOR FILTER AND MANUFACTURE OF COLOR FILTER BY USING SAME

摘要

PROBLEM TO BE SOLVED: To provide the photosensitive composition capable of forming the color filter superior in heat resistance and intimate contact and resistance to chemicals and the method manufacturing the color filter by using this composition by incorporating a photopolymerizable compound, a photopolymerization initiator, a pigment, a cross-linking agent, and an acid generator. SOLUTION: The photosensitive composition contains (a) the photopolymerizable compound, (b) the photopolymerization initiator, (c) the pigment, (d) the cross-linking agent, and (e) the acid generator. It is preferred that the (a) compound is a compound represented by the formula in which each of R1 and R2 is an H or halogen atom of a 1-5C alkyl group; R3 is an H atom or a methyl group; X is a 1-5C alkylene group optionally having a 1-3C alkyl group, a -CO- or -O- group or the like of X may be absent; Y is acid anhydride residue, such as the one of maleic acid, succinic acid, or itaconic acid; and (n) is an integer of 1-20. The (a) component can be contained in the range of 20-50weight% of the sum of (a)-(c) components in the photosensitive composition.