| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. ensuring satisfactory sensitivity and resolution at the time of using a light source for exposure giving <=250nm wavelength, excellent in dry etching resistance and less liable to a change in performance with the lapse of time after exposure by using a resin having an acid generating group, an alicyclic group and an acid-decomposable group introduced into the same molecule. SOLUTION: This photosensitive compsn. contains a resin having repeating structural units each having a group that generates an acid when degraded by irradiation with active light or radiation, repeating structural units each having an alicyclic group and repeating structural units each having a group that increases solubility in an alkali developer when decomposed by the action of the acid. The alicyclic group is preferably a polycyclic alicyclic group. The resin preferably has structural units each having a carboxyl group. It is preferable that this compsn. further contains a low molecular acid-decomposable dissolution inhibiting compd. having a group that can be decomposed by the action of the acid, increasing solubility in an alkali developer by the action of the acid and having a mol.wt. of <=3,000. |
