发明名称 |
ZONE PLATE PRODUCTION, RETICLE FOR ZONE PLATE AND ITS PRODUCTION |
摘要 |
PROBLEM TO BE SOLVED: To obtain a process for producing a zone plate capable of lessening the misalignment of the patterns formed at the zone plate. SOLUTION: In the process for producing the zone plate which forms zone plate patterns by projection aligning the patterns formed on a reticle for the zone plate; the correlation between the shape of the pattern formed on the reticle 100 for the zone plate and the shape of the image of the pattern projected on a sensitive substrate 104 is previously calculated and such a pattern Pn at which the pattern image projected onto this sensitive substrate 104 forms the desired zone plate pattern is formed on the reticle 100 for the zone plate in accordance with this correlation. |
申请公布号 |
JPH10221835(A) |
申请公布日期 |
1998.08.21 |
申请号 |
JP19970020309 |
申请日期 |
1997.02.03 |
申请人 |
NIKON CORP |
发明人 |
EBI MASAMI |
分类号 |
G02B5/18;G03F1/00;G03F1/68 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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