| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an improved forming method of a black resist pattern by which contamination on the surface (rear surface) of a transparent substrate where a black resist pattern and a pixel/image of each color are not formed can be efficiently cleaned and removed, and to provide a producing method of a color filter. SOLUTION: After a photopolymerizable compsn. in which a black material is dispersed is applied on a transparent substrate, the compsn, is dried by heating, exposed for an image, developed, washed with water and thermally hardened to form a black resist pattern. In these processes, after the developing process is started and before the thermal hardening processes a developer is sprayed on the rear surface of the transparent substrate. And a photopolymerizable compsn. having dispersion of a red, green of blue color materials is used to form the pixel/image of the respective colors by the same treatments as above described on the black resist pattern (black matrix). In the processes to form the black matrix and the pixel/image of each color, after the developing process is started and before the thermal hardening process of each color, the developer is sprayed on the rear surface of the transparent substrate.</p> |
