| 摘要 |
<p>The present invention relates to polymer precursors used in stereolithography. Specifically, the invention provides a novel resin having a glass transition temperature (Tg) that is substantially higher than any existing resins. The polymer precursors comprise an admixture of at least one vinyl ether, functionalized compound and at least one epoxy functionalized compound, at least one acrylate functionalized compound, and a photoinitiator, wherein the polymer precursor composition cures by a dual cure mechanism utilizing a free radical pathway as well as a cationic pathway thus yielding improved green strength.</p> |
