GAS ETCHING FOLLOWED BY GAS PLATING,申请号USD3460985-传众专利搜索

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发明名称	GAS ETCHING FOLLOWED BY GAS PLATING
摘要
申请公布号	US3460985(A)	申请公布日期	1969.08.12
申请号	USD3460985	申请日期	1966.02.01
申请人	SIEMENS AG.	发明人	ERHARD SIRTL
分类号	C23C14/00;C23C16/00;(IPC1-7):B44D1/18;B44D1/34;C23C11/00	主分类号	C23C14/00
代理机构		代理人
主权项
地址

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