| 摘要 |
<p>A film deposition apparatus of an artificial lattice multi-layered film for depositing a gigantic magnetoresistive film (GMR film) having an artificial lattice structure formed by alternately laminating magnetic metal films and non-magnetic metal films on a substrate, and for making it possible to deposit stably and easily an artificial lattice multi-layered film having GMR characteristics, characterized by a target (23) equipped on the lower surface thereof with a magnetron magnet (25), a cylindrical chimney (26) covering at least the target (23) and having an open surface facing the target (23), and a chimney top (29) sealing the opening of the chimney (26) and having a chimney opening portion (30) on the surface thereof opposing the target (23), wherein plasma rings (34a, 34b) are generated from the upper surface of the target (23) when the substrate (33) passes over the upper surface of the chimney top (29), and deposits the sputtered molecules onto the substrate (33).</p> |
