PHOTOSENSITIVE FILM COPOLYMER, ITS PRODUCTION, PHOTOSENSITIVE FILM, ITS PRODUCTION, METHOD FOR SYNTHESIZING MONOMER, PRODUCTION OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To obtain an ArF photosensitive film resin having excellent etching resistance, heat resistance and adhesiveness and hardly soluble in a developer (aqueous THAM solution) by copolymerizing a mixture containing a bicycloalkene and maleic anhydride or vinylene carbonate. SOLUTION: The bicycloalkene (A) used is represented by formula I (wherein R is H, a 1-10C alkyl; and n is 1 or 2) and is exemplified by 2-hydroxyethyl-5- norbornene-2-carboxylate. Maleic anhydride (B) used is represented by formula II, and the vinylenecarbonate used is represented by formula III. Referring to an example of the polymerization, component A comprising the above carboxylate and t-butyl-5-norbornene-2-carboxylate is reacted with maleic anhydride (component B) at 65-120 deg.C under a pressure of 50-200atm. The molecular weight of the obtained photosensitive film copolymer falls in the range of 3,000-100,000.