发明名称 METHOD FOR VAPOR DEPOSITION ON FLEXIBLE BASE
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition method capable of preventing the rupture, etc., of a flexible base (base film) even when the acceleration voltage of an electron beam is increased at the time of vapor deposition of a ferromagnetic metal on the base film in production of magnetic recording media, etc. SOLUTION: This method for vapor deposition on the flexible base consists in irradiating the metal 10 for vapor deposition in a crucible 8 with an electron beam and depositing the metal on the surface of the flexible base transported along the surface of a cooling drum 5 from the aperture of a shielding plate 4. The shielding plate 9 is kept open during the evaporation rate of the metal for vapor deposition in the crucible attains the desired rate. The degree of the opening is kept in such a manner that the min. opening angle (θmin) formed by the line connecting the aperture and the metal for vapor deposition and the line connecting the contact point with the cooling drum and the line connecting the contact point and the center of the cooling drum attains 65 to 85 deg.. The shielding plate is then opened to the prescribed degree after the evaporation rate of the metal attains the desired rate. The metal is deposited by evaporation on the surface of the flexible base from the aperture.
申请公布号 JPH10219433(A) 申请公布日期 1998.08.18
申请号 JP19970040103 申请日期 1997.02.07
申请人 TDK CORP 发明人 OTSUKA TOSHIYUKI;YAMANAKA SHUNICHI;TAKAI MITSURU;ARIGA NOBUO
分类号 C23C14/14;C23C14/30;(IPC1-7):C23C14/14 主分类号 C23C14/14
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