| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device which can reproducibly set a volumetric flow amount of a vacuum pump and enable adaption to each vacuum process. SOLUTION: A method and a device are provided to obtain advantageous influence in process inside a vacuum chamber. A part of gas flow is returned to a suctioning flange through a connection piping 8 and a control valve 9 in a vacuum pump 1 composed of one or plurality of stages 2a, 2b, 2c. Pressure on the suctioning side is increased, while a volumetric flow amount in respect to gas to be discharged is reduced by means of the pump 1. It is thus possible to accurately and directly control the volumetric flow amount of the vacuum pump 1. |
