| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve reaction efficiency by generating turbulence and accelerating mixing of waste gasses and air and to prevent the increase in ventilation resistance and to decrease the frequencies of dust removal work so as to improve productivity by lessening the dust deposition of a detoxifying apparatus. SOLUTION: This apparatus has a water scrubber for removing the water-soluble component gases and/or hydrolysis component gases in the waste gases of semiconductor production including at least either of the water-soluble component gases or the hydrolysis component gases and thermal cracking component gases and an oxidation thermal cracking apparatus which executes the oxidation thermal cracking of the oxidation thermal cracking component gases in the water gases of water scrubbing. The reaction cylinder (C) of the oxidation thermal cracking apparatus is internally provided with stirring rods (D), (E) moving circumferentially in a contactless state along at lest either of the inside surface or outside surface of an introducing pipe (A) for introducing the waste gases of water scrubbing from below to above.</p> |
