Verfahren zur Herstellung einer einseitig beschichteten und mit einem Finish versehenen Halbleiterscheibe
摘要
<p>The method involves treating a semiconducting plate to a double-sided finishing process and then applying a coating to one side of the plate. The plate is then subjected to a second process producing a double-sided finish. The finishing processes are selected from a group of processing methods which include double-sided polishing and double-sided fine grinding.</p>
申请公布号
DE19704546(A1)
申请公布日期
1998.08.13
申请号
DE1997104546
申请日期
1997.02.06
申请人
WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AG, 84489 BURGHAUSEN, DE