发明名称 Verfahren zur Herstellung einer einseitig beschichteten und mit einem Finish versehenen Halbleiterscheibe
摘要 <p>The method involves treating a semiconducting plate to a double-sided finishing process and then applying a coating to one side of the plate. The plate is then subjected to a second process producing a double-sided finish. The finishing processes are selected from a group of processing methods which include double-sided polishing and double-sided fine grinding.</p>
申请公布号 DE19704546(A1) 申请公布日期 1998.08.13
申请号 DE1997104546 申请日期 1997.02.06
申请人 WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AG, 84489 BURGHAUSEN, DE 发明人 PIETSCH, GEORG, DIPL.-PHYS. DR., 84489 BURGHAUSEN, DE;SAUTER, BERND, DIPL.-PHYS. DR., 84547 EMMERTING, DE;FEUCHTINGER, ERNST, 84384 WITTIBREUT, DE
分类号 B24B37/08;H01L21/02;H01L21/20;H01L21/304;(IPC1-7):H01L21/304 主分类号 B24B37/08
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