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发明名称
Verfahren für das selektive Wachstum einer Dünnschicht auf einem gemusterten Substrat
摘要
申请公布号
DE69129722(D1)
申请公布日期
1998.08.13
申请号
DE1991629722
申请日期
1991.09.20
申请人
ANELVA CORP., FUCHU, TOKIO/TOKYO, JP;NEC CORP., TOKIO/TOKYO, JP
发明人
AKETAGAWA, KEN-ICHI, FUCHU-SHI, TOKYO, JP;SAKAI, JUNRO, FUCHU-SHI, TOKYO, JP;TATSUMI, TORU, MINATO-KU, TOKYO, JP
分类号
C30B25/02;C30B25/18;H01L21/20;(IPC1-7):H01L21/20;C30B29/06
主分类号
C30B25/02
代理机构
代理人
主权项
地址
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