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发明名称
Verfahren zur Herstellung einer supraleitenden Einrichtung mit reduzierter Dicke der supraleitenden Schicht und dadurch hergestellte supraleitende Einrichtung
摘要
申请公布号
DE69128753(T2)
申请公布日期
1998.08.13
申请号
DE1991628753T
申请日期
1991.09.19
申请人
SUMITOMO ELECTRIC INDUSTRIES, LTD., OSAKA, JP
发明人
NAKAMURA, TAKAO, CABINET BALLOT-SCHMIT, F-75116 PARIS, FR;INADA, HIROSHI, CABINET BALLOT-SCHMIT, F-75116 PARIS, FR;IIYAMA, MICHITOMO, CABINET BALLOT-SCHMIT, F-75116 PARIS, FR
分类号
H01L39/14;(IPC1-7):H01L39/22;H01L39/24
主分类号
H01L39/14
代理机构
代理人
主权项
地址
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