| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive resist compsn, excellent in the balance of performances such as sensitivity, resolution and profile. SOLUTION: This positive resist compsn, contains an alkali soluble novolac resin and radiation-sensitive agent of a quinone diazide, and further contains an acid producing agent which is decomposed by the effect of an alkali developer to produce acid. The compsn. further contains a compd. having a sensitizing effect to wavelengths of radiation used for patterning exposure. By the acid producing agent, the profile is significantly improved without decreasing sensitivity and resolution. By the presence of the sensitizer, the resolution can be also improved. |
