| 摘要 |
<p>PROBLEM TO BE SOLVED: To make it possible to identify a foreign body precisely and quickly by a method wherein spectrums, for reference, which are registered in advance in a library are compared with a generated spectrum and the spectrum, for reference, which is estimated to be identical to the generated spectrum is selected. SOLUTION: A wafer 5 is positioned, a wafer number is read out, a recipe which corresponds to the wafer 5 is read out, and the wafer 5 is conveyed to an X-Y stage 12 inside a sample chamber 11 so as to be positioned by an optical microscope 13. A wafer map which corresponds to the wafer 5 is displayed on a display 9, a foreign body to be analyzed is designated from foreign bodies on the wafer map, the stage is moved, and the designated foreign body is situated just under electron beam. The electron beam is irradiated, an image is formed by a scanning electron microscope(SEM), the image is compared with an image for reference, by the SEM, which corresponds to a designated analytical part and which is registered, and the designated foreign body is positioned precisely. One point on the designated foreign body is irradiated with the electron beam, characteristic X-rays 14 are detected so as to be compared with a registered spectrum for reference and the spectrum, for reference, which is estimated to be identical is selected.</p> |
