发明名称 Exposure apparatus wherein a wafer contact portion of a movable stage includes linear ridges
摘要 A plurality of ridge-shaped contact portions are formed on a wafer holder to extend in a direction parallel to the scanning direction, and chucking grooves for chucking the lower surface of a wafer are formed on these contact portions. The lower surface of the wafer is pushed up by movable members which are vertically movably arranged in the Z direction between the contact portions, thereby correcting any curve of the wafer in the transverse direction. Alternatively, the curve of the wafer is corrected by adjusting the pressure in a space defined by adjacent contact portions and the wafer.
申请公布号 US5793474(A) 申请公布日期 1998.08.11
申请号 US19950533933 申请日期 1995.09.26
申请人 NIKON CORPORATION 发明人 NISHI, KENJI
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B27/42;G03B27/58 主分类号 G03F7/20
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