| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a forming method of an improved black resist pattern and a producing method of a color filter so that a storing black resist pattern which does not cause peeling, etc., by the succeeding various treatments can be formed and that contamination on the surface of a transparent substrate where the black resist pattern and pixel/image of each color are formed and on the surface where no pattern is formed can be efficiently removed. SOLUTION: After a photopolymerizable compsn. in which a black color material is dispersed is applied to a transparent substrate, the compsn. is dried by heating, exposed for an image, developed and thermally hardened to form a black resist pattern. In this process, the transparent substrate is subjected to irradiation on the front and back surfaces after the developing treatment but before the thermal hardening treatment. Each photopolymerizable compsn. in which red, green or blue material is dispersed is used to form pixels/image of each color on the surface where the black matrix is formed and these pixels/image is subjected to the same treatment as above described except for the thermal hardening treatment. Then the pixels/image thermally hardened at least after the last developing treatment of the developing treatment for each color.</p> |
