| 摘要 |
<p>PROBLEM TO BE SOLVED: To form an X-ray absorber so that the stress of the absorber at all points may become zero or negligible values. SOLUTION: At the time of forming an X-ray absorber on a mask substrate by sputtering a target 3 while the mask substrate is rotated, a dummy mask substrate 5 is first provided instead of the mask substrate and the film of a dummy X-ray absorber 6 is formed to the extent possible to sputter on the dummy mask substrate 5. Then, the stress distribution at each location on a straight line passing through the center of the dummy X-ray absorber 6 is measured, the point having a good linear characteristic of the part of the stress distribution where the compressive stress drops toward the outer periphery of the absorber 6 is set as a desired stress distribution extent X, and the X-ray absorber is formed by positioning the mask substrate within the desired stress distribution X by using the center of the extent X as the center of rotation of the mask substrate.</p> |
