发明名称 ELECTRODE PLATE FOR PLASMA ETCHING
摘要 PROBLEM TO BE SOLVED: To obtain an electrode plate for plasma etching with reduced production of particles by using glassy carbon having a lattice constant in a specific range regarding a specific plane of an included crystal. SOLUTION: The glassy carbon has a structure where graphite crystals dispersedly exists in an amorphous matrix. Fluorocarbon polymer is generated by entrance of fluorine between the graphite crystal layers, and the polymer becomes particles. However, the production of particles can be reduced by forming an electrode plate 10 for plasma etching with glassy carbon having the lattice constant in the range of 3.450Åto 4.500Åregarding the (002) plane of the graphite crystal. The electrode plate 10 is formed by processing the glassy carbon into a disk having a diameter of 200mm and a thickness of 300mm, forming 1,700 pieces through holes 12 each having a diameter of 0.8mm in the disk, forming an attachment hole 14, then, mirror-processing the surfaces of the disk, thereafter, performing purification processing by using chlorine gas.
申请公布号 JPH10214819(A) 申请公布日期 1998.08.11
申请号 JP19970013850 申请日期 1997.01.28
申请人 SUMITOMO METAL IND LTD 发明人 FUJIWARA TORU
分类号 C23F4/00;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23F4/00
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