发明名称 TARGET MATERIAL FOR FORMING CARBON FILM
摘要 PROBLEM TO BE SOLVED: To provide a target material for forming a carbon film capable of stably forming the carbon protective film which is homogeneous and excellent in hardness with excellent yield for a long time by sputtering. SOLUTION: A target material is formed of glass-like carbon sheet of the crystalline properties in which the difference in the mean lattice surface clearance d002 of the graphite hexagonal network layer is <=0.01nm, the difference in the crystal size Lc(002) is <=1.5nm at a surface layer part and a center part. Preferably, the value of the mean lattice surface clearance d002 of the graphite hexagonal network layer at the center part is 0.345-0.365nm, and the crystalline size Lc(002) is 1.3-4.0nm.
申请公布号 JPH10212571(A) 申请公布日期 1998.08.11
申请号 JP19970031306 申请日期 1997.01.30
申请人 TOKAI CARBON CO LTD 发明人 HATA TOMIO
分类号 C04B35/52;C01B31/02;C23C14/34 主分类号 C04B35/52
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