发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To eliminate the need for periodical pressure-adjusting work in a reaction tube and a load-lock chamber in pressure adjustment by automating adjustment of a gas flow rate. SOLUTION: Pressure sensors 6 and 7 are provided for detecting pressures in a reaction tube 1 and a load-lock chamber 2, respectively. The pressures detected by the both sensors 6 and 7 are compared at a comparator 8, which in turn issues a valve adjustment signal according to its comparison result to control an opening degree of a valve 10. The comparator 8 is connected to a motor 9 to rotate the motor according to a control signal. Rotation of the motor 9 causes the valve travel of the needle valve 10 to be controlled, whereby a discharge amount of a discharge tube 4 of the reaction tube 1 is adjusted so that inputs to the comparator 8 coincide with each other. Thereby pressures in the reaction tube 1 and load-lock chamber 2 can be made equal to each other.
申请公布号 JPH10214873(A) 申请公布日期 1998.08.11
申请号 JP19970017053 申请日期 1997.01.30
申请人 KOKUSAI ELECTRIC CO LTD 发明人 MAESE KAZUAKI
分类号 C23C16/44;C23C16/455;H01L21/205;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 C23C16/44
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