| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device in which rational maintenance can be realized. SOLUTION: In a substrate processing device in which a predetermined processing is performed while a vertical substrate 9 is transferred vertically, a processing part 2 to perform the predetermined processing to a substrate 9 is provided with an opening/closing part 2a which can be opened/closed in a penetrated path for transferring the substrate 9. The opening/closing part 2a is connected with a fixing part 2b excluding itself through a hinge 231, and it can be rotated/shifted for opening/closing action at an axis J as a center. In addition, the fixing part 2b is fixed to the device body. Further, a vat 412 having an opening OP is provided on the lower side of the part 2 so as to receive a treatment liquid leaking from an opening/closing position BD. Thus, owing to such a configuration, maintenance work within the part 2 can be performed rationally in the substrate processing device in which the part 2 is located at high position, and the leakage of processing liquid can be solved easily through such an opening/closing mechanism. |
