| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate transfer device which allows reduction of a setting-up area by effectively utilizing a space in the up-and-down directions and a substrate treatment device provided with it. SOLUTION: A treatment region B includes an upper treatment regions B1 and a lower treatment region B2. In the upper treatment region B1, a plurality of substrate treatment units 201 are arranged in a plurality of steps and in the lower treatment region, B2 also a plurality of substrate units 202 are arranged in a plurality of steps. In correspondence to the upper treatment region B1 and the lower treatment region B2, an upper transfer region and a lower transfer region are arranged. The upper transfer region is provided with a substrate transfer unit 101 and the lower transfer unit is provided with a substrate transfer unit 102. Respective transfer units 101, 102 include a flexible elevator mechanism 4 each. The interval between the upper transfer region and the lower transfer region is shielded with a partition 25. One end side of the transfer regions is provided with an elevater device 300 transferring the substrate in the up-and-down directions. |
