发明名称 DISCHARGE TRAP EQUIPMENT OF SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To automate filter-exchange and cleaning, by constituting piping for cleaning in which fluid for cleaning is made to flow. SOLUTION: A channel 26 connects piping 22 for cleaning with piping 23 for cleaning. Unnecessary gas during the treatment and after reaction is discharged through piping 19 for discharge, a channel 25 and piping 21 for discharge. During discharge, liquid or gas for cleaning is made to flow in the channel 26 and the piping 23 for cleaning, from the piping 22 for cleaning, thereby eliminating reaction product adhering to a filter 27 in the channel 26. When treatment progresses, and the reaction product adhering to the filter 27 increases, a pressure sensor or the like detects the increase of discharge resistance, and rotates a valve body 24 by 180 deg., at the time point of detection, with a necessary driving means such as a solenoid and a cylinder. When the valve body 24 is rotated, the channel 26 having a cleaned filter 28 connects the piping 19 for discharge with the piping 21 for discharge, and discharges the gas. The channel 25 connects the piping 22 for cleaning with the piping 23 for cleaning, and cleans the filter 27.</p>
申请公布号 JPH10209138(A) 申请公布日期 1998.08.07
申请号 JP19970019957 申请日期 1997.01.17
申请人 KOKUSAI ELECTRIC CO LTD 发明人 SATO TAKAYUKI
分类号 B01D53/34;H01L21/205;H01L21/22;H01L21/304;H01L21/31;(IPC1-7):H01L21/31 主分类号 B01D53/34
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