| 摘要 |
PROBLEM TO BE SOLVED: To facilitate cleansing of a cleaning mask of an X-ray mask with causing no deformation of the X-ray mask by so constituting that an action line of the mask maintenance force, by means of a mask maintenance member may not pass through the back etching part of the X-ray mask. SOLUTION: The back central part of a mask substrate 117 is subjected to back etching, a back etching part 126 is irradiated with an X-ray, and a pattern in almost the same form with an X-ray absorber metal pattern 119 is transcribed on an exposed substrate 121 as a resist pattern. At this time an X-ray mask 120 is detachably maintained in the inside of a frame main body 2 with two mask maintenance member for being made into a part where the line of action maintaining the X-ray mask 120 of this mask maintaining member 6 does not pass through the back etching part 126 of the X-ray mask 120. As a result, the X-ray mask 120 can be cleansed with no consideration of man-hour of connection and disconnection to an X-ray mask frame. |
