| 摘要 |
PROBLEM TO BE SOLVED: To provide the photosensitive composition highly sensitive to light in the near infrared wavelength region of 800-1300nm and a photosensitive plate for the lithographic printing plate and its manufacturing method by incorporating a specified resin compound, an amino compound derivative capable of cross-linking it, a specified infrared absorber, and an acid photogenerator in the composition. SOLUTION: This photosensitive composition comprises the novolak resin or a polyvinylphenol resin, and the amino compound capable of cross-linking this resin compound, the infrared absorber selected from pyrylium and thipyrylium compounds, and the acid photogenerator, and the infrared absorber is, preferably, a compound represented by the formula in which each of Y<1> and Y<2> is an O or S atom; each of R<1> , R<2> , R<9> , and R<10> is a phenyl or naphthyl group and each of R<3> -R<8> is an H atom or a 1-8 C alkyl group or each of R<3> and R<4> , R<5> and R<6> , and R<7> and R<8> may combine with each other to form a bonding group; X is an H or halogen atom; each of l<1> and l<2> is 0 or 1; and Z<-> is a counter ion. |
