| 发明名称 |
OBJECT INSPECTION AND/OR MODIFICATION SYSTEM AND METHOD |
| 摘要 |
A system and method for measuring, analysis, removal, addition or imaging of material using nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Techniques for fabricating such nanostructures and techniques for combining these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography. |
| 申请公布号 |
WO9834092(A2) |
申请公布日期 |
1998.08.06 |
| 申请号 |
WO1998US01528 |
申请日期 |
1998.01.21 |
| 申请人 |
RAVE, L.L.C.;KLEY, VICTOR, B. |
发明人 |
KLEY, VICTOR, B. |
| 分类号 |
G01Q10/00;G01Q30/02;G01Q30/16;G01Q40/00;G01Q40/02;G01Q60/06;G01Q60/10;G01Q60/18;G01Q60/24;G01Q70/02;G01Q70/08;G01Q70/16;G01Q80/00;G03F1/00;G03F7/20;G11B5/23;G11B5/31 |
主分类号 |
G01Q10/00 |
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