发明名称 VIALESS INTEGRATED INDUCTIVE ELEMENTS FOR ELECTROMAGNETIC APPLICATIONS
摘要 <p>An inductor suitable for integration in VLSI circuits and devices is fabricated by means of a post foundry procedure involving the deposition and patterning of layers of conductor material (32), isolation material (34), core material (50), isolation material (52) and conductor material (54) to produce conductive coils (60, 62) wrapped around a magnetic core without the need for vias. The fabrication steps utilize a combination of microelectronic and micromachining technologies.</p>
申请公布号 WO1998034287(A1) 申请公布日期 1998.08.06
申请号 US1998001879 申请日期 1998.01.30
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