发明名称 Method of manufacturing a field emission electron source and field emission deviced manufactured by said process
摘要 <p>A micro-tip electron source has micro-tips, each of which consists of a first frusto-conical portion (20) of a first conductive material and a second conical tip portion deposited on the first portion and made of a second conductive material which can be thinned by selective etching w.r.t. the first material. Pref. the first material is Nb and the second material is Mo, Si, Cr, Fe or Ni. Also claimed is a cathodoluminescent display device including the above micro-tip electron source. Pref. the height of the first portion (20) is such that its top is at the same level as the lower plane (I) of the grids (10a) of the source. The micro-tips are pref. subjected to cleaning and the second tip portion is subjected to thinning by surface etching.</p>
申请公布号 EP0856868(A2) 申请公布日期 1998.08.05
申请号 EP19980201095 申请日期 1995.04.24
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 MEYER, ROBERT;VAUDAINE, PIERRE;RAMBAUD, PHILIPPE
分类号 H01J1/304;H01J9/02;(IPC1-7):H01J9/02;H01J1/30 主分类号 H01J1/304
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