发明名称 Compound semiconductor device
摘要 A compound semiconductor device having a first compound semiconductor layer, a second compound semiconductor layer containing at least In or Al which is in contact with the first compound semiconductor layer to generate a two dimensional electron gas layer in the interface between the first and second compound semiconductor layers, a third compound semiconductor layer of GaAs provided so as to be coated on the second compound semiconductor layer, a source electrode and a drain electrode electrically connected to the two dimensional electron gas layer, and a gate electrode provided between the source electrode and the drain electrode so as to be in Schottky contact with the third compound semiconductor layer.
申请公布号 US5789767(A) 申请公布日期 1998.08.04
申请号 US19970906110 申请日期 1997.08.05
申请人 FUJITSU LIMITED 发明人 OMURA, SOSHI
分类号 H01L29/812;H01L21/285;H01L21/335;H01L21/338;H01L29/778;(IPC1-7):H01L31/032;H01L31/033;H01L31/072;H01L31/109 主分类号 H01L29/812
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