发明名称 |
TREATMENT OF GAS CONTAINING ORGANIC HALOGEN COMPOUND AND CATALYST FOR DECOMPOSITION OF ORGANIC HALOGEN COMPOUND |
摘要 |
PROBLEM TO BE SOLVED: To decompose an org. halogen compd. with a catalyst maintaining its performance for a long time and to produce the catalyst for decomposition. SOLUTION: A flow of gas contg. less than 10vol.% org. halogen compd. is brought into contact with a catalyst contg. titania, silica and tungsten oxide as titania surface-coated with a porous layer of silica and tungsten oxide in the presence of less than 30vol.% steam based on the total flow rate of the gas to treat the org. halogen compd. The concn. of the silica is 0.5 to <2wt.% of that of the titania, and the titania and tungsten oxide are contained so that the molar ratio between Ti and W is regulated to (20-95):(80-5). The temp. of the flow does not exceed 500 deg.C. The org. halogen compd. is decomposed into CO, CO2 and hydrogen halide. |
申请公布号 |
JPH10202061(A) |
申请公布日期 |
1998.08.04 |
申请号 |
JP19970009175 |
申请日期 |
1997.01.22 |
申请人 |
HITACHI LTD |
发明人 |
SUGANO SHUICHI;ARATO TOSHIAKI;IKEDA SHINZO;YASUDA TAKESHI;YAMASHITA HISAO;AZUHATA SHIGERU;TAMADA SHIN |
分类号 |
B01D53/86;B01J23/30;B01J27/047 |
主分类号 |
B01D53/86 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|