发明名称 TREATMENT OF GAS CONTAINING ORGANIC HALOGEN COMPOUND AND CATALYST FOR DECOMPOSITION OF ORGANIC HALOGEN COMPOUND
摘要 PROBLEM TO BE SOLVED: To decompose an org. halogen compd. with a catalyst maintaining its performance for a long time and to produce the catalyst for decomposition. SOLUTION: A flow of gas contg. less than 10vol.% org. halogen compd. is brought into contact with a catalyst contg. titania, silica and tungsten oxide as titania surface-coated with a porous layer of silica and tungsten oxide in the presence of less than 30vol.% steam based on the total flow rate of the gas to treat the org. halogen compd. The concn. of the silica is 0.5 to <2wt.% of that of the titania, and the titania and tungsten oxide are contained so that the molar ratio between Ti and W is regulated to (20-95):(80-5). The temp. of the flow does not exceed 500 deg.C. The org. halogen compd. is decomposed into CO, CO2 and hydrogen halide.
申请公布号 JPH10202061(A) 申请公布日期 1998.08.04
申请号 JP19970009175 申请日期 1997.01.22
申请人 HITACHI LTD 发明人 SUGANO SHUICHI;ARATO TOSHIAKI;IKEDA SHINZO;YASUDA TAKESHI;YAMASHITA HISAO;AZUHATA SHIGERU;TAMADA SHIN
分类号 B01D53/86;B01J23/30;B01J27/047 主分类号 B01D53/86
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