发明名称 Semiconductor optical integrated device
摘要 The invention provides a semiconductor optical integrated device which includes (a) a semiconductor layer, (b) a plurality of masks formed on the semiconductor layer, each of the masks having a shape varying in an axial direction of a light waveguide, and (c) quantum well structure selectively grown on the semiconductor layer by metal organic vapor phase epitaxy (MOVPE). The quantum well structure includes a well layer having a thickness and a bandgap wherein at least one of the thickness and bandgap in a region is different from those in another regions, a shape of said masks in the region being different from that in the another regions. The invention provides many advantages, one of which is that light waveguides having different bandgaps from one another can be formed on a common plane by single selective growth. This makes it possible to communicate regions to one another with high optical coupling ratio.
申请公布号 US5790580(A) 申请公布日期 1998.08.04
申请号 US19970819198 申请日期 1997.03.17
申请人 NEC CORPORATION 发明人 SAKATA, YASUTAKA;NAKAMURA, TAKAHIRO;AE, SATOSHI
分类号 H01L27/15;G02B6/12;G02F1/025;H01S5/00;H01S5/026;H01S5/042;H01S5/20;H01S5/343;H01S5/40;(IPC1-7):H01S3/19;G02B6/10;H01L33/00 主分类号 H01L27/15
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