发明名称 Methods for fabrication of thin film inductors, inductor networks, inductor/capactor filters, and integration with other passive and active devices, and the resultant devices
摘要 The fabrication of thin film inductors on a substrate, which may include thin film resistors, thin film capacitors, and semiconductor devices. In one embodiment an inductor is fabricated initially on a substrate and then integrated with other devices subsequently formed on the substrate. In this embodiment, process steps used to fabricate such other devices utilize temperatures sufficiently low to prevent damaging or destroying the characteristics of the inductor. In another embodiment the fabrication of an inductor is achieved through photoresist masking and plating techniques. In alternative embodiments, fabrication of an inductor is achieved by sputtering, photoresist processes and etching/ion-milling techniques. A combination of various individual process steps from various embodiments are suitable for use to fabricate the individual layers to achieve a structure of this invention. The inductor fabricated in accordance with this invention is connected to other passive or active components through metal interconnections in order to improve the frequency performance of the inductor. In certain embodiments, parasitic capacitance of the inductor is significantly reduced by fabricating inductor coils on dielectric bridges. In certain embodiments, a magnetic core of ferromagnetic material is used to improve the performance of the inductor at frequencies below about 100 MHz.
申请公布号 US5788854(A) 申请公布日期 1998.08.04
申请号 US19940312322 申请日期 1994.09.26
申请人 CALIFORNIA MICRO DEVICES CORPORATION 发明人 DESAIGOUDAR, CHAN M.;GUPTA, SUREN
分类号 H01F41/04;H01F17/00;H01F27/00;H01L21/822;H01L23/522;H01L27/00;H01L27/04;H01L27/08;H05K1/16;H05K3/46;(IPC1-7):B44C1/22;H01L21/00 主分类号 H01F41/04
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