| 摘要 |
A charged particle-beam transfer mask includes a first area having a low degree of scattering or absorbing of charged particle beams, a second area higher in degree of scattering or absorbing of the charged particle beams than the first area, and dose correction member. This correction member is provided in order that when the charge particle-beams are applied to a sensitive substrate through the first and second areas, a distribution of dose in the sensitive substrate is different from that obtained without the dose correction member. Typically, the dose correction member is constituted by a film which is formed on the first area, and is higher in degree of scattering or absorbing the charged particle-beams than the first area but lower than the second area, and this film is disposed adjacent to the second area in a manner to partly cover the first area.
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